June 24, 2025 — Du Shaonan, Director of the Confidentiality Review Division at the Preliminary Examination Department of the China National Intellectual Property Administration (CNIPA) Patent Office, accompanied by Wang Jiao, Deputy Director of the Intellectual Property Service Office of the Sichuan Provincial Administration for Market Regulation, visited Chengdu Image Design Technology Co., Ltd. (hereinafter referred to as "Image Design"). The visit aimed to gain an in-depth understanding of the current status, needs, and challenges faced by integrated circuit design companies regarding intellectual property protection, particularly the protection of layout-design rights, as well as to gather feedback from innovators on the existing protection system. Wang Yong, Executive Vice President of Image Design, along with the company's intellectual property team, participated in the entire research visit and engaged in discussions.
News
Focusing on Core Issues
During the symposium, the two parties engaged in pragmatic discussions on how to enhance the layout-design protection system to better serve innovators. Image Design shared its practical experience in protecting layout-designs, along with progress made in advancing technology localization and achieving fully independent R&D of core IP. The core topics of discussion focused on key challenges currently facing intellectual property protection in the integrated circuit industry. Image Design pointed out that although China's EDA industry continues to develop, it still relies on foreign software tools for critical design stages. Achieving full-process coverage and effective substitution with domestic EDA tools requires further breakthroughs, representing a major bottleneck for autonomous and controllable development. Both sides conducted in-depth discussions on difficulties in determining layout-design infringement, particularly issues related to insufficient clarity when existing layout-designs are used as evidence in infringement cases. They agreed that this affects the efficiency of determinations and the success rate of rights enforcement, and exchanged constructive suggestions on potential improvement paths. Additionally, Image Design shared its strategic shift in IP protection—from a defensive approach to actively building core technology barriers.
News
Government-Enterprise Dialogue Deepens
Director Du Shaonan attentively listened to the company's requests and suggestions, paying particular attention to key issues such as support for domestic EDA tools and improving the clarity of layout-design evidence. He stated that the China National Intellectual Property Administration (CNIPA) highly values feedback from innovators, and the frontline insights gained from this research visit are crucial for continuously improving the integrated circuit layout-design protection system and optimizing the intellectual property protection environment. These insights will provide a solid foundation for subsequent policy formulation and service optimization, effectively supporting the high-quality development of the chip industry. Deputy Director Wang Jiao expressed that Sichuan Province will continue to enhance its intellectual property service ecosystem and fully support hard-tech companies like Image Design in boosting their core competitiveness. This research visit has effectively strengthened government-enterprise mutual trust and laid a solid foundation for jointly exploring new intellectual property protection pathways that better align with industrial development needs.
This research visit provided Image Design with a direct communication channel with China's national intellectual property authorities, allowing the company to fully articulate its practical experience and concerns regarding integrated circuit layout-design protection. The company's core appeals—including support for domestic EDA tools and improved clarity in infringement determinations—received positive responses. This engagement has bolstered Image Design's confidence and momentum as it moves to strengthen core technology barriers, address intellectual property challenges, and achieve higher-quality development.
